Loading patent…
AssigneeTotal SA
InventorsClaire Weiss, Renaud Cadours, Jing Zhao, Virenkumar Shah, Serge Capdeville
Estimating the term…
A process for selectively removing hydrogen sulphide relative to carbon dioxide from a gaseous mixture containing at least hydrogen sulphide H2S and carbon dioxide CO2, includes a step of contacting the gaseous mixture with an absorbent solution including at least one amine, water, and at least one C2 to C4 thioalkanol. A use of the absorbent solution for selectively removing hydrogen sulphide relative to carbon dioxide from a gaseous mixture containing at least hydrogen sulphide and carbon dioxide, is disclosed. Disclosed is a use of at least one C2 to C4 thioalkanol as an additive in an absorbent solution including at least one amine, and water, for increasing the selectivity of the absorbent solution for the removal of hydrogen sulphide relative to carbon dioxide from a gaseous mixture containing at least hydrogen sulphide and carbon dioxide.
A process for selectively removing hydrogen sulphide H2S relative to carbon dioxide CO2 from a gaseous mixture containing at least hydrogen sulphide H2S and carbon dioxide CO2, the process comprising contacting the gaseous mixture with an absorbent solution comprising at least one amine, water, and at least one C2 to C4 thioalkanol.
A process comprising using an absorbent solution comprising at least one amine, at least one C2-C4 thioalkanol, and water to selectively remove hydrogen sulphide H2S relative to carbon dioxide from a gaseous mixture comprising at least hydrogen sulphide and carbon dioxide.
A process comprising using at least one C2 to C4 thioalkanol as an additive in an absorbent solution comprising at least one amine and water, to increase selectivity of the absorbent solution for the removal of hydrogen sulphide relative to carbon dioxide from a gaseous mixture comprising at least hydrogen sulphide and carbon dioxide.
Dependencies are inferred from the claim text.