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US 2015/0146841 A1Published application
Metrology device and metrology method thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsSu-Horng LIN, Chi-Ming YANG
Life of this patent
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Abstract
A metrology device includes a light source and an image sensor. The light source is configured for providing an X-ray illuminating a wafer. The image sensor is configured for detecting a spatial domain pattern produced when the X-ray illuminating the wafer.
Claims20
A metrology device, comprising:
- a light source for providing an X-ray illuminating a wafer;
- and
- an image sensor for detecting a spatial domain pattern produced when the X-ray illuminating the wafer.
A metrology device comprising:
- a electromagnetic radiation source for providing electromagnetic radiation having a wavelength in the range of 0.01 to 10 nm illuminating a wafer;
- and
- an image sensor for detecting a spatial domain pattern produced when the electromagnetic radiation illuminating the wafer.
A metrology method for measuring the morphology of a wafer, comprising:
- providing an X-ray to illuminate a wafer;
- and
- detecting a spatial domain pattern produced when the X-ray illuminating the wafer.
Dependencies are inferred from the claim text.