Methods for Forming Electrically Precise Capacitors, and Structures Formed Therefrom
AssigneeThin Film Electronics ASA
InventorsArvind KAMATH, Criswell CHOI, Patrick SMITH, Erik SCHER, Jiang LI
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AssigneeThin Film Electronics ASA
InventorsArvind KAMATH, Criswell CHOI, Patrick SMITH, Erik SCHER, Jiang LI
Estimating the term…
High precision capacitors and methods for forming the same utilizing a precise and highly conformal deposition process for depositing an insulating layer on substrates of various roughness and composition. The method generally comprises the steps of depositing a first insulating layer on a metal substrate by atomic layer deposition (ALD); (b) forming a first capacitor electrode on the first insulating layer; and (c) forming a second insulating layer on the first insulating layer and on or adjacent to the first capacitor electrode. Embodiments provide an improved deposition process that produces a highly conformal insulating layer on a wide range of substrates, and thereby, an improved capacitor.
A method of forming a capacitor, comprising:
A capacitor, comprising:
Dependencies are inferred from the claim text.