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AssigneeASML Netherlands B.V.
InventorsJan Bernard Plechelmus Van Schoot, Antonius Theodorus Wilhelmus Kempen, Hermanus Kreuwel, Andrei Mikhailovich Yakunin
Estimating the term…
A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.
A method of generating EUV radiation in a radiation source for a lithographic apparatus, the method comprising:
A radiation source for generating EUV radiation, said radiation source comprising:
A lithographic apparatus comprising a radiation source for generating EUV radiation, said radiation source comprising:
A radiation source for generating EUV radiation, the radiation source comprising:
Dependencies are inferred from the claim text.