US 2015/0146178 A1 · Substrate Tuning System and Method Using Optical Projection

Abstract

Techniques herein include systems and methods that provide a spatially-controlled or pixel-based projection of light onto a substrate to tune various substrate properties. A given pixel-based image projected on to a substrate surface can be based on a substrate signature. The substrate signature can spatially represent non-uniformities across the surface of the substrate. Such non-uniformities can include energy, heat, critical dimensions, photolithographic exposure dosages, etc. Such pixel-based light projection can be used to tune various properties of substrates, including tuning of critical dimensions, heating uniformity, evaporative cooling, and generation of photo-sensitive agents. Combining such pixel-based light projection with photolithographic patterning processes and/or heating processes improves processing uniformity and decreases defectivity. Embodiments can include using a digital light processing (DLP) chip, grating light valve (GLV), or other grid-based micro projection technology.

Claims20

Dependent claims

A processing system for treating substrates, the processing system comprising:

a chamber sized and configured to receive a substrate for processing;
a substrate holder positioned within the chamber and configured to hold the substrate;
an image projection system configured to project an image onto an upper surface of the substrate when the substrate is in the chamber, the image projection system using a micro-mirror projection device to project the image;
and
a controller configured to control the image projection system and cause the image projection system to project a pixel-based image onto the upper surface of the substrate.

2 more elements

Dependencies are inferred from the claim text.

Substrate Tuning System and Method Using Optical Projection

Life of this patent

Substrate Tuning System and Method Using Optical Projection

Life of this patent

Abstract

Claims20