Liquid crystal display and method of manufacturing the same

A method of manufacturing a liquid crystal display, the method comprising:

• forming an original roof layer on a carrier substrate;
• forming a transfer structure by forming a common electrode on the original roof layer;
• forming a partition wall on a display panel including a thin film transistor;
• forming a plurality of microcavities surrounded by the partition wall and the original roof layer by transferring the transfer structure onto the display panel;
• separating the carrier substrate from the transfer structure;
• exposing a part of the common electrode by partially removing the original roof layer;
• forming a liquid crystal injection hole formation region between the microcavities by partially etching the exposed part of the common electrode;
• injecting a liquid crystal material into the microcavities through the liquid crystal injection hole formation region;
• and
• forming a capping layer to fill the liquid crystal injection hole formation region.

A method of manufacturing a liquid crystal display, the method comprising:

• forming a transfer structure by forming an original roof layer on a substrate;
• forming a partition wall on a display panel including a thin film transistor;
• forming a plurality of microcavities surrounded by the partition wall and the original roof layer by transferring the transfer structure onto the display panel;
• separating a carrier substrate from the transfer structure;
• exposing a part of the common electrode by partially removing the original roof layer;
• forming a liquid crystal injection hole formation region between the microcavities by partially etching an exposed part of the common electrode;
• injecting a liquid crystal material into the microcavities through the liquid crystal injection hole formation region;
• and
• forming a capping layer to fill the liquid crystal injection hole formation region.

A method of manufacturing of a liquid crystal display, the method comprising:

• forming an original roof layer on a carrier substrate;
• forming a transfer structure including a roof layer region and a partition wall region by exposing the original roof layer;
• transferring the transfer structure onto a display panel including a thin film transistor;
• separating the carrier substrate from the transfer structure;
• respectively forming a roof layer and a partition wall at the roof layer region and the partition wall region by developing the original roof layer, forming a plurality of microcavities surrounded by the partition wall and the original roof layer, and forming a liquid crystal injection hole formation region between the microcavities;
• forming a common electrode on the roof layer;
• injecting a liquid crystal material into the microcavities through the liquid crystal injection hole formation region;
• and
• forming a capping layer to fill the liquid crystal injection hole formation region.

A method of manufacturing a liquid crystal display, the method comprising:

• forming an original roof layer on a carrier substrate;
• forming a transfer structure including a roof layer region and a partition wall region by exposing the original roof layer;
• transferring the transfer structure onto a display panel including a thin film transistor;
• separating the carrier substrate from the transfer structure;
• forming a common electrode on the original roof layer;
• exposing a part of the original roof layer by patterning the common electrode;
• respectively forming a roof layer and a partition wall at the roof layer region and the partition wall region by developing the original roof layer, forming a plurality of microcavities surrounded by the partition wall and the original roof layer, and forming a liquid crystal injection hole formation region between the microcavities;
• injecting a liquid crystal material into the microcavities through the liquid crystal injection hole formation region;
• and
• forming a capping layer to fill the liquid crystal injection hole formation region.