Display substrate, method of manufacturing the same, and display device including the same

A method of manufacturing a display substrate, the method comprising:

• forming a first gate electrode and a scan line to be electrically connected to the first gate electrode on a base substrate;
• forming a gate insulation layer on the base substrate to substantially cover the first gate electrode and the scan line;
• forming an active layer on the gate insulation layer to substantially overlap the first gate electrode;
• forming an etch stop layer on the gate insulation layer to at least partially cover the active layer;
• forming a source electrode and a drain electrode on the etch stop layer to be electrically connected to the active layer;
• forming a passivation layer on the etch stop layer to substantially cover the source electrode and the drain electrode;
• and
• forming a data line on the passivation layer to at least partially overlap the scan line.

A display device, comprising:

• a first gate electrode formed on a base substrate;
• a scan line electrically connected to the first gate electrode;
• a gate insulation layer, an etch stop layer and a passivation layer formed on the base substrate to at least partially cover the first gate electrode and the scan line;
• an active layer at least partially covered by the etch stop layer,
• a source electrode and a drain electrode formed on the etch stop layer to be electrically connected to the active layer;
• a data line formed on the passivation layer to at least partially overlap the scan line;
• a pixel electrode electrically connected to the drain electrode;
• a light-emitting layer formed on the pixel electrode;
• and
• an opposite electrode formed on the light-emitting layer.