Drawing data creating method, drawing apparatus, drawing method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsSatoru Oishi, Hideki Ina
Life of this patent
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Abstract
The present invention relates to a method for drawing data that indicates a timing at which a substrate is irradiated with a beam. The method includes determining whether or not a mark to be irradiated with the beam exists in a predetermined region on a substrate. The method further includes creating, in a case where the mark exists in the predetermined region, the drawing data such that a mark region including the mark is irradiated with the beam at a predetermined timing after a region other than the mark region is irradiated with the beam.
Claims20
A method for drawing data that indicates a timing at which a substrate is irradiated with a beam, the method comprising:
- determining whether or not a mark to be irradiated with the beam exists in a predetermined region on the substrate;
- and
- creating, in a case where the mark exists in the predetermined region, the drawing data such that a mark region including the mark is irradiated with the beam at a predetermined timing after a region other than the mark region is irradiated with the beam.
A method for drawing data that indicates a timing at which a substrate is irradiated with a beam, the method comprising:
- determining whether or not a mark to be irradiated with the beam exists in a predetermined region on the substrate;
- and
- creating, in a case where the mark exists in the predetermined region, the drawing data such that the mark region including the mark is irradiated with the beam at a predetermined timing after the mark region is irradiated with a beam in lower energy than a predetermined value and also a region other than the mark region is irradiated with the beam in higher energy than the predetermined value.
An apparatus that draws a pattern on a substrate with a beam, the apparatus comprising:
- a position measurement device configured to measure a position of a mark formed on the substrate;
- and
- a control unit configured to control irradiation of the substrate with the beam,
- wherein, in a case where the mark exists in a predetermined region, the control unit controls the irradiation of the substrate in a manner that, at a predetermined timing after a region other than a mark region including the mark is irradiated with the beam, the mark region is irradiated with the beam.
An apparatus that draws a pattern on a substrate with a beam, the apparatus comprising:
- a position measurement device configured to measure a position of a mark formed on the substrate;
- and
- a control unit configured to control irradiation of the substrate with the beam,
- wherein, in a case where the mark exists in a predetermined region, the control unit controls the irradiation of the substrate in a manner that, at a predetermined timing after a mark region including the mark is irradiated with a beam in lower energy than a predetermined value, and also the region other than the mark region is irradiated with the beam in higher energy than the predetermined value, the mark region is irradiated with the beam.
A method comprising:
- determining whether or not a mark to be irradiated with a beam exists in a predetermined region on a substrate;
- and
- creating, in a case where the mark exists in the predetermined region, drawing data that indicates a timing at which the substrate is irradiated with the beam in a manner that, at a predetermined timing after a region other than a mark region including the mark is irradiated with the beam, the mark region is irradiated with the beam;
- and
- drawing a pattern on the substrate with the beam based on the drawing data.
An article manufacturing method comprising:
- irradiating a substrate with a beam by using an apparatus;
- developing the substrate;
- and
- performing at least one of etching processing and ion implantation processing on the substrate,
- wherein the apparatus comprises:
- a position measurement device configured to measure a position of a mark formed on the substrate;
- and
- a control unit configured to control irradiation of the substrate with the beam, and
- wherein, in a case where the mark exists in a predetermined region, the control unit controls the irradiation of the substrate in a manner that, at a predetermined timing after a region other than a mark region including the mark is irradiated with the beam, the mark region is irradiated with the beam.
Dependencies are inferred from the claim text.