Method for manufacturing capacitor, and capacitor
AssigneeFujitsu Limited
InventorYoshihiko IMANAKA
Life of this patent
Estimating the term…
Abstract
A method for manufacturing a capacitor, includes: accelerating conductor particles by ejecting the conductor particles together with gas, each surface of the conductor particles covered with a dielectric entirety; fixing the conductor particles to a substrate with the surface of the conductor particles still covered with the dielectric entirely by colliding the conductor particles with the substrate; and sandwiching a deposited film formed of the conductor particles fixed to the substrate between electrodes.
Claims5
A method for manufacturing a capacitor, comprising:
- accelerating conductor particles by ejecting the conductor particles together with gas, each surface of the conductor particles covered with a dielectric entirely;
- fixing the conductor particles to a substrate with the surface of the conductor particles still covered with the dielectric entirely by colliding the conductor particles with the substrate;
- and
- sandwiching a deposited film formed of the conductor particles fixed to the substrate electrodes.
3-8. (canceled)
A method for manufacturing a capacitor, comprising:
- applying a compressive stress to conductor particles, each surface of the conductor particles covered with a dielectric entirely, to fix the conductor particles to each other with the surface of the conductor particles stilt covered with the dielectric entirely and
- sandwiching a structural body formed of the conductor particles fixed to each other, between electrodes.
10-11. (canceled)
Dependencies are inferred from the claim text.