Chemical mechanical polisher with hub arms mounted
AssigneeApplied Materials, Inc.
InventorsSteven M. ZUNIGA, Chih Hung CHEN, Jay GURUSAMY
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Abstract
A chemical mechanical polishing system is provided. The chemical mechanical polishing system includes a platen, a load cup, a hub, a first polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup, and a second polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup the second arm rotatable independently from the hub.
Claims20
A chemical mechanical polishing system, comprising:
- a platen;
- a load cup;
- a hub;
- a first polishing arm cantilevered from the hub and rotatable around a centerline of the hub between the platen and the load cup;
- and
- a second polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and the load cup, the second polishing arm rotatable independently from the hub.
A chemical mechanical polishing system, comprising:
- a platen;
- a load cup;
- a hub rotatable about a first axis;
- a first polishing arm pivotally attached to a first pivot on the hub and moveable between the platen and load cup;
- and
- a second polishing arm pivotally attached to a second pivot on the hub and moveable between the platen and load cup.
A method for moving a substrate by a substrate handler, the method comprising:
- loading a substrate from a load cup into a first polishing head attached to a first end of a first polishing arm, wherein a second end of the first polishing arm is pivotally attached to a first pivot on an indexable hub;
- and
- moving the substrate to a processing station by either indexing the hub or rotating the first polishing arm about the first pivot.
Dependencies are inferred from the claim text.