Tft array substrate, manufacturing method thereof and display panel

A display panel, comprising a TFT array substrate, Wherein the TFT array substrate comprises:

• a TFT area, comprising
• a TFT first electrode layer,
• a TFT second electrode layer,
• a TFT insulation layer, and
• a TFT etching stop layer,
• a storage capacitor in a storage capacitor area, the storage capacitor comprising:
• a capacitor first electrode layer,
• a capacitor second electrode layer,
• a capacitor insulation layer, and
• a capacitor etching stop layer,
• wherein the TFT first electrode layer and the capacitor first electrode layer are formed in a shared first electrode layer,
• wherein the TFT second electrode layer and the capacitor second electrode layer are formed in a shared second electrode layer,
• wherein the TFT insulation layer and the capacitor insulation layer are formed in a shared insulation layer,
• wherein the TFT etching stop layer and the capacitor etching stop layer are formed in a shared etching stop layer,
• wherein the shared first electrode layer, the shared etching stop layer, and the shared second electrode layer are sequentially stacked.

A method of manufacturing a TFT array substrate, the method comprising:

• sequentially forming a first electrode layer and an insulation layer on a substrate;
• etching the insulation layer in a storage capacitor area;
• forming an etching stop layer at a location where the insulation layer is etched;
• and
• forming a second electrode layer on the etching stop layer.