Vapor deposition apparatus

A vapor deposition apparatus comprising:

• a substrate mount unit on which a substrate is mounted, the substrate mount unit comprising an electrostatic generation part;
• a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit;
• a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material having a radical form, in the direction of the substrate mount unit;
• a diffusion unit which distributes the second raw material into the plurality of second nozzle units;
• and
• a plasma module unit which supplies the second raw material to the diffusion unit,
• wherein the electrostatic generation part of the substrate mount unit induces the second raw material to the substrate mount unit.