Lithography apparatus, method of measuring surface position, and method of producing device
AssigneeCanon Kabushiki Kaisha
InventorShinji Ohishi
Life of this patent
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Abstract
An apparatus includes a conductive holding part configured to hold an insulating material, and a capacitance sensor configured to generate an electric field between the capacitance sensor and the holding part. The apparatus determines a surface position of a surface of the insulating material based on information of an output value of the capacitance sensor obtained in a case where the insulating material is located in the electric field and information associated with capacitance of the insulating material, and then adjusts the surface position of the insulating material at a pattern formation position.
Claims14
An apparatus comprising:
- a holding part being conductive and configured to hold an insulating material;
- a capacitance sensor configured to generate an electric field between the capacitance sensor and the holding part;
- and
- a controller configured to determine a surface position of the insulating material based on an output value of the capacitance sensor obtained in a case where the insulating material is located in the electric field and based on information associated with capacitance of the insulating material, and to adjust the surface position of the insulating material at a pattern formation position using the determined surface position.
A method of measuring a surface position, comprising:
- providing an insulating material on a conductive material;
- obtaining information associated with capacitance of the insulating material;
- obtaining an output value of a capacitance sensor in a state in which the insulating material is located between the conductive material and the capacitance sensor;
- and
- determining the surface position of the insulating material based on the information associated with capacitance of the insulating material and the output value of the capacitance sensor.
An apparatus configured to measure a surface position of an insulating material on a conductive material, comprising:
- a capacitance sensor;
- and
- a controller configured to determine the surface position of the insulating material based on information associated with capacitance of the insulating material and an output value of the capacitance sensor obtained in a state in which the insulating material is located between the conductive material and the capacitance sensor.
A method of producing a device, comprising:
- forming a pattern on a substrate using an apparatus;
- and
- performing an etching process on the substrate on which the pattern is formed,
- wherein the apparatus includes
- a holding part being conductive and configured to hold an insulating material,
- a capacitance sensor configured to generate an electric field between the capacitance sensor and the holding part, and
- a controller configured to determine a surface position of the insulating material based on an output value of the capacitance sensor obtained in a case where the insulating material is located in the electric field and based on information associated with capacitance of the insulating material, and to adjust the surface position of the insulating material at a pattern formation position using the determined surface position.
Dependencies are inferred from the claim text.