US 2015/0092167 A1 · PROCESSING LIQUID SUPPLYING APPARATUS AND PROCESSING LIQUID SUPPLYING METHOD

Abstract

Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

Claims33

Dependent claims

A processing liquid supplying apparatus comprising:

a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed;
an ejection unit connected to the processing liquid supply source through a supply path and configured to eject the processing liquid to the substrate to be processed;
a filter device provided in the supply path and configured to remove foreign matters in the processing liquid;
a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively;
and
a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using at least one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

3 more elements

A processing liquid supplying method in which a processing liquid for processing a substrate to be processed is supplied to the substrate to be processed after passing through a filter device to remove foreign materials, the method comprising:

decompressing and degassing the processing liquid supplied from a processing liquid supply source by using at least one of a supply pump and an ejection pump which are provided at a primary side and a secondary side of the filter device, respectively;
passing the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump, and
ejecting the processing liquid at the secondary side of the filter device to the substrate to be processed through an ejection unit by the ejection pump.

Dependencies are inferred from the claim text.

Processing liquid supplying apparatus and processing liquid supplying method

Life of this patent

Processing liquid supplying apparatus and processing liquid supplying method

Life of this patent

Abstract

Claims33