Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

A method of manufacturing a semiconductor device, comprising:

• loading a substrate into a processing chamber and mounting the substrate on a substrate mounting table;
• driving the substrate mounting table to move the substrate mounted on the substrate mounting table;
• supplying a processing gas into the processing chamber;
• and
• generating plasma with a first density by plasmarizing the processing gas and concurrently generating plasma with a second density lower than the first density by plasmarizing the processing gas at a position adjacent to the plasma of the first density in a traveling direction of the substrate to process the substrate mounted on the substrate mounting table.

A non-transitory computer-readable recording medium storing a program that causes a computer to perform a process comprising:

• loading a substrate into a processing chamber and mounting the substrate on a substrate mounting table;
• driving the substrate mounting table to move the substrate mounted on the substrate mounting table;
• supplying a processing gas into the processing chamber;
• and
• in the processing chamber, generating plasma of a first density by plasmarizing the processing gas and concurrently generating plasma of a second density lower than the first density by plasmarizing the processing gas at a position adjacent to the plasma of the first density in a traveling direction of the substrate to process the substrate mounted on the substrate mounting table.