Contact strap for memory array
AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsLing WU, Jianbo YANG, Kian Hong LIM, Sung Mun JUNG
Life of this patent
Estimating the term…
Loading patent…
AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsLing WU, Jianbo YANG, Kian Hong LIM, Sung Mun JUNG
Estimating the term…
Devices and methods for forming a device are disclosed. The method includes providing a substrate having a memory array region. Front end of line (FEOL) process is performed to form components of memory cell pairs. The FEOL process forms storage gates, access gates or word lines, source/drain regions, spacers, erase gates and source line isolation dielectrics. The memory cell pair shares a common source line (SL). A SL strap opening is provided. The source line strap opening is formed between adjacent memory cell pair. The source line strap opening does not overlap the storage gate of the memory cell.
A method for forming a device comprising:
Dependencies are inferred from the claim text.