Method for selectively isolating hydrogen or helium using a natrolite-based zeolite, and novel natrolite-based zeolite

A gallosilicate PST-1 zeolite having a framework structure consisting of oxides having a molar ratio shown in the following formula (1), the gallosilicate PST-1 zeolite being characterized by X-ray diffraction patterns including lattice distances shown Table 12 below:

• 1.0K2O:1.0Ga2O3:2.3˜2.7SiO2 (1)
• TABLE 12
• 2θ
• D
• 100 × I/I0
• 12.9~13.0
• 6.9~6.8
• 50~100
• 14.9~15.0
• 6.0~5.9
• 1~30
• 19.8~19.9
• 4.5~4.4
• 5~30
• 20.4~20.5
• 4.4~4.3
• 1~5
• 23.6~23.7
• 3.8~3.7
• 1~5
• 25.9~26.0
• 3.5~3.4
• 5~10
• 27.0~27.1
• 3.3~3.2
• 1~5
• 28.7~28.8
• 3.2~3.1
• 1~20
• 29.1~29.2
• 3.1~3.0
• 5~10
• 30.0~30.1
• 3.00~2.90
• 55~100
• 33.2~33.3
• 2.70~2.65
• 1~5
• 34.2~34.3
• 2.65~2.60
• 1~20
• 35.3~35.4
• 2.55~2.50
• 5~20
• 35.4~35.5
• 2.55~2.50
• 5~20
• 37.0~37.1
• 2.45~2.40
• 1~5
• 41.5~41.6
• 2.20~2.15
• 0~5
• 42.2~42.3
• 2.15~2.10
• 1~5
• 43.4~43.5
• 2.10~2.05
• 0~5
• 44.4~44.5
• 2.05~2.00
• 1~5
• 46.6~46.7
• 1.95~1.90
• 0~5
• wherein θ, d and I indicate Bragg angle, lattice distance, and x-ray diffraction peak intensity, respectively.

A method for preparing a gallosilicate PST-1 zeolite having X-ray diffraction patterns including lattice distances shown in Table 11 below, the method comprising heating a compound represented by the following formula (2) at a temperature between 100° C. and 200° C. for 0.5˜10 days:

• x K2O:y Ga2O3:10.0SiO2:z H2O (2)
• wherein x=5˜12 moles, y=0.5˜5.0 moles, and z=60˜300 moles;
• TABLE 11
• 2θ
• D
• 100 × I/I0
• 12.9~13.0
• 6.9~6.8
• 100
• 19.8~19.9
• 4.5~4.4
• 5~10
• 20.4~20.5
• 4.4~4.3
• 1~5
• 25.9~26.0
• 3.5~3.4
• 10~15
• 29.1~29.2
• 3.1~3.0
• 5~10
• 30.0~30.1
• 3.00~2.90
• 55~60
• 34.2~34.3
• 2.65~2.60
• 1~6
• 35.3~35.4
• 2.55~2.50
• 5~10
• 35.4~35.5
• 2.55~2.50
• 10~15
• 37.0~37.1
• 2.45~2.40
• 1~5
• 44.4~44.5
• 2.05~2.00
• 1~5

A method for preparing a gallosilicate PST-1 zeolite having X-ray diffraction patterns including lattice distances shown in Table 12 below, the method comprising heating a compound represented by the following formula (2) at a temperature between 100° C. and 200° C. for 0.5˜10 days:

• x K2O:y Ga2O3:10.0SiO2:z H2O (2)
• wherein x=5˜12 moles, y=0.5˜5.0 moles, and z=60˜300 moles;
• TABLE 12
• 2θ
• D
• 100 × I/I0
• 12.9~13.0
• 6.9~6.8
• 50~100
• 14.9~15.0
• 6.0~5.9
• 1~30
• 19.8~19.9
• 4.5~4.4
• 5~30
• 20.4~20.5
• 4.4~4.3
• 1~5
• 23.6~23.7
• 3.8~3.7
• 1~5
• 25.9~26.0
• 3.5~3.4
• 5~10
• 27.0~27.1
• 3.3~3.2
• 1~5
• 28.7~28.8
• 3.2~3.1
• 1~20
• 29.1~29.2
• 3.1~3.0
• 5~10
• 30.0~30.1
• 3.00~2.90
• 55~100
• 33.2~33.3
• 2.70~2.65
• 1~5
• 34.2~34.3
• 2.65~2.60
• 1~20
• 35.3~35.4
• 2.55~2.50
• 5~20
• 35.4~35.5
• 2.55~2.50
• 5~20
• 37.0~37.1
• 2.45~2.40
• 1~5
• 41.5~41.6
• 2.20~2.15
• 0~5
• 42.2~42.3
• 2.15~2.10
• 1~5
• 43.4~43.5
• 2.10~2.05
• 0~5
• 44.4~44.5
• 2.05~2.00
• 1~5
• 46.6~46.7
• 1.95~1.90
• 0~5