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US 2015/0085234 A1Published application
Lcos device and method of fabricating the same
AssigneeUnited Microelectronics Corp.
InventorsYi-Ming Hsu, Feng-Ying Hsu, Chieh-Yu Tsai
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Abstract
The present invention provides a LCOS device including a silicon substrate, a first dielectric layer, a first mirror layer, a second dielectric layer, and a second mirror layer. The first dielectric layer is disposed on the silicon substrate. The first mirror layer is disposed on the first dielectric layer. The second dielectric layer is disposed on the first mirror layer. The second minor layer is disposed on the second dielectric layer.
Claims17
A method of fabricating a LCOS device, comprising:
- forming a first dielectric layer on a silicon substrate;
- forming a first mirror layer on the first dielectric layer;
- forming a second dielectric layer on the first mirror layer;
- and
- forming a second mirror layer on the second dielectric layer.
2 more elements
A LCOS device, comprising:
- a silicon substrate;
- a first dielectric layer disposed on the silicon substrate;
- a first mirror layer disposed on the first dielectric layer;
- a second dielectric layer disposed on the first mirror layer;
- and
- a second mirror layer disposed on the second dielectric layer.
3 more elements
Dependencies are inferred from the claim text.