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AssigneeCymer, Inc.
InventorsVahan Senekerimyan, Martijn Wehrens
Estimating the term…
A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.
A system for timing the firing of a source laser in an EUV LPP light source having a droplet generator which releases a droplet at a predetermined speed, the source laser firing pulses at an irradiation site, comprising:
A method for timing the firing of a source laser in an EUV LPP light source having a droplet generator which releases a droplet at a predetermined speed, the source laser firing pulses at an irradiation site, comprising:
A non-transitory computer readable storage medium having embodied thereon instructions for causing a computing device to execute a method for timing the firing of a source laser in an EUV LPP light source having a droplet generator for sequentially generating droplets of target material, the source laser firing pulses at an irradiation site to irradiate the droplets so as to create a plasma, the method comprising:
Dependencies are inferred from the claim text.