Systems and methods for fabricating semiconductor device structures

A method of fabricating a semiconductor device structure, the method comprising:

• fabricating a feature of the semiconductor device structure on a first wafer of semiconductor material having a first value for a design parameter;
• obtaining first raw measurement data for the first wafer from a metrology tool, the metrology tool utilizing an existing measurement model;
• determining an adjusted measurement model based at least in part on the first raw measurement data, the first value, second raw measurement data obtained from the metrology tool for a second wafer, and a second value, the second wafer having the second value for the design parameter;
• configuring the metrology tool to utilize the adjusted measurement model when a quality metric indicates the adjusted measurement model is better than the existing measurement model.