US 2015/0031808 A1 · PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF

Abstract

The invention relates to a photosensitive polysiloxane composition and a thin film formed by the aforementioned photosensitive polysiloxane composition. The thin film is a planarization film of a TFT substrate, an interlayer insulating film or an overcoat of a core material or a protective material in a waveguide. The invention is to provide a photosensitive polysiloxane composition having excellent surface flatness and high tapered angle of a pattern. The photosensitive polysiloxane composition comprises a polysiloxane (A), an o-naphthoquinone diazide sulfonic acid ester (B), an alkali-soluble resin containing a silyl group (C) and a solvent (D).

Claims18

Dependent claims

A photosensitive polysiloxane composition comprising:

a polysiloxane (A);
an o-naphthoquinone diazide sulfonic acid ester (B);
an alkali-soluble resin containing a silyl group (C);
and
a solvent (D).

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

14/332,680Filed 16 Jul 2014

Priority

TW 10212336725 Jul 2013

Published

29 Jan 2015

Term ends

Not estimatedThe source records don’t support an estimate.

Classification9 codes

G03F 7/0233
Macromolecular quinonediazides; Macromolecular additives, e.g. binders: characterised by the polymeric binders or the macromolecular additives…
G03F 7/038
Photosensitive materials: macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/0757
Silicon-containing compounds: macromolecular compounds containing Si-O, Si-C or Si-N bonds
G03F 7/0758
Macromolecular compounds containing Si-O, Si-C or Si-N bonds: with silicon- containing groups in the side chains

Photosensitive polysiloxane composition and uses thereof

Life of this patent

Photosensitive polysiloxane composition and uses thereof

Life of this patent

Abstract

Claims18