Optical reflective diffraction device having a high resistance to laser flux
AssigneeCommissariat à I'Énergie Atomique et aux Énergies Alternatives
InventorsJérôme Neauport, Eric Lavastre, Laurent Gallais, Nicolas Bonod
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Abstract
The present invention relates to an optical device for reflective diffraction with high diffraction efficiency and high laser flux resistance. The device includes a protective structure having at least one mixture layer produced by a uniform mixture of a first material and of a second material, where both of these are dielectric, and wherein said first material has an optical index lower than that of the said second material.
Claims11
An optical device for reflective diffraction of an incident light beam, comprising:
- a diffraction grating having a dielectric layer in which is etched a periodic arrangement of patterns, where the said dielectric layer is deposited on a protective structure, itself deposited on a thin dielectric layer made of a first dielectric material of a reflecting structure including a stack of thin dielectric layers made alternately of a first dielectric material and of a second dielectric material, where the said first material has an optical index lower than that of the second material,
- where the said protective structure includes at least one first mixture layer produced by a uniform mixture of the said first and second dielectric materials, and wherein the optical index of the said first mixture layer is higher than that of the said first dielectric material.
An optical device for reflective diffraction of an incident light beam according to the previous claim, wherein the said protective structure includes the said first mixture layer deposited on an intermediate dielectric layer made of the said first dielectric material, where the said intermediate dielectric material is deposited on a second mixture layer produced by a homogenous mixture of the said first and second dielectric materials, and where the optical index of the said second mixture layer is higher than that of the said first dielectric material.
An optical device for reflective diffraction of an incident light beam, wherein a protective structure is deposited on a thin dielectric layer made of a first dielectric material of a reflecting structure including a stack of thin dielectric layers made alternately of a first dielectric material and of a second dielectric material, where the said first dielectric material has an optical index lower than that of the said second dielectric material,
- where the said protective structure includes at least one first mixture layer produced by a homogenous mixture of the said first and second dielectric materials, wherein the optical index of the said first mixture layer is higher than that of the said first dielectric material, and wherein a periodic arrangement of patterns is etched on the free surface of the said protective structure so as to form a diffraction grating.
Dependencies are inferred from the claim text.