Optical system for a microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsMichael Patra, Johannes Eisenmenger, Markus Schwab
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Abstract
An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes, relative to the optical beam path downstream of the mirror arrangement, at least one deflection surface at which a deflection of the optical axis occurs. The at least one deflection surface has refractive power.
Claims20
An optical system having an optical axis, the optical system having an optical beam path along which light travels through the optical system during use of the optical system, the optical system comprising:
- a mirror arrangement comprising a plurality of mirror elements which are adjustable independently of one another to alter an angular distribution of light reflected by the mirror arrangement during use of the optical system;
- and
- a deflection device comprising a deflection surface having refractive power,
- wherein:
- the deflection surface is downstream of the mirror arrangement along the optical beam path;
- during use of the optical system, a deflection of the optical axis occurs at the deflection surface;
- and
- the optical system is a microlithographic optical system.
An optical system having an optical axis, the optical system having an optical beam path along which light travels through the optical system during use of the optical system, the optical system comprising:
- a micromirror array;
- and
- a deflection device comprising a deflection surface having refractive power,
- wherein:
- the deflection surface is downstream of the micromirror array along the optical beam path;
- during use of the optical system, a deflection of the optical axis occurs at the deflection surface;
- and
- the optical system is a microlithographic optical system.
Dependencies are inferred from the claim text.