Substrate processing apparatus, substrate processing method and storage medium
AssigneeTokyo Electron Limited
InventorTomohiro Kaneko
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AssigneeTokyo Electron Limited
InventorTomohiro Kaneko
Estimating the term…
A substrate processing unit 14 includes processing modules 2 each performing a process on a substrate, and a substrate transfer device 121 is provided between a mounting unit 11 and the processing modules. A parameter storage unit 3 stores sets of transfer parameter 33 where an operating speed of the substrate transfer device corresponds to a processing number of substrates per a unit time. A parameter selecting unit 4 compares a processing number of substrates per a unit time determined based on a recipe 31 corresponding to the process, with those corresponding to the transfer parameters and selects a transfer parameter corresponding to the minimum processing number of substrates among the processing numbers of substrates equal to or larger than that determined based on the recipe. A transfer control units 151 to 153 control the substrate transfer device based on a set value of the selected transfer parameter.
A substrate processing apparatus, comprising:
A substrate processing method of transferring substrates by a substrate transfer device between a mounting unit mounting thereon the substrates to be processed and a substrate processing unit including a plurality of processing modules each performing a process on the substrate, and of processing the substrates in the processing modules, the substrate processing method comprising:
Dependencies are inferred from the claim text.