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AssigneeEdwards Limited
InventorsSergey Alexandrovich Voronin, Christopher James Philip Clements, John Leslie Bidder
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An apparatus for treating a gas stream. A plasma generator generates a plasma flare. A first inlet conveys the gas stream into the apparatus. A reaction chamber is located downstream of the plasma generator in which gas is treated. A second inlet receives a liquid into the apparatus for establishing a liquid weir over an interior surface of the reaction chamber for resisting accumulation of solid deposits on the interior surface. A weir guide has an outer annular surface for directing liquid over the interior surface and an inner annular surface in flow communication with the outer surface so that liquid flows form the outer surface to the inner surface to resist depositing on the inner surface.
An apparatus for treating a gas stream, comprising a plasma generator for generating a plasma flare, a first inlet for conveying the gas stream into the apparatus, and a reaction chamber downstream of the plasma generator in which the gas stream is treated by the generated plasma flare, a second inlet for receiving a liquid into the apparatus for establishing a liquid weir over an interior surface of the reaction chamber for resisting the accumulation of solid deposits from plasma treatment on the interior surface, and a flow director having an outer annular surface in flow communication with the second inlet and located relative to the interior surface for directing the liquid over the interior surface and an inner annular surface in flow communication with the outer annular surface so that liquid can flow over the interior annular surface to resist depositing on the inner annular surface.
A flow director in or for an apparatus for treating a gas stream, the apparatus comprising a plasma generator for generating a plasma flare, a first inlet for conveying the gas stream into the apparatus, and a reaction chamber downstream of the plasma generator in which the gas stream is treated by the generated plasma flare, a second inlet for receiving a liquid into the apparatus for establishing a liquid weir over an interior surface of the reaction chamber for resisting the accumulation of solid deposits from plasma treatment on the interior surface, the flow director having an outer annular surface in flow communication with the second inlet and located relative to the interior surface for directing the liquid over the interior surface and an inner annular surface in flow communication with the outer annular surface so that liquid can flow over the interior annular surface to resist depositing on the inner annular surface.
A flow director having an outer annular surface that, in use, will be arranged in flow communication with a liquid inlet and located relative to the interior surface of a reaction chamber for directing the liquid over the interior surface of the reaction chamber, wherein the flow director further comprises an inner annular surface in flow communication with the outer annular surface so that said liquid can flow over the interior annular surface to resist depositing on the inner annular surface of the flow director.
Dependencies are inferred from the claim text.