Vapor Deposition Apparatus for Continuous Deposition of Multiple Thin Film Layers on a Substrate

A vapor deposition apparatus to form stacked thin films on discrete photovoltaic module substrates conveyed in a continuous non-stop manner through said apparatus, the apparatus comprising:

• a first sublimation compartment positioned over a first deposition area of said apparatus, wherein the first sublimation compartment comprises:
• a first receptacle configured for receipt of a first source material;
• a first heated distribution manifold disposed below said first receptacle, said first heated distribution manifold configured to heat said first receptacle to a degree sufficient to sublimate the first source material within said first receptacle;
• a movable first shutter plate disposed above said first distribution manifold, said first shutter plate comprising a plurality of first passages therethrough that align with said first passages in said first distribution manifold in an open-position of said first shutter plate to allow passage of sublimated first source material through said first heated distribution manifold;
• and
• a first actuator connected to said first shutter plate and configured to move the first shutter plate with respect to the first distribution manifold to control the flow of sublimated first source material therethrough;
• a second sublimation compartment positioned over a second deposition area of said apparatus, wherein the second sublimation compartment comprises:
• a second receptacle configured for receipt of a second source material;
• a second heated distribution manifold disposed below said second receptacle, said second heated distribution manifold configured to heat said first receptacle to a degree sufficient to sublimate the second source material within said second receptacle;
• a movable second shutter plate disposed above said second distribution manifold, said second shutter plate comprising a plurality of second passages therethrough that align with said second passages in said second distribution manifold in an open-position of said second shutter plate to allow passage of sublimated second source material through said second heated distribution manifold;
• and
• a second actuator connected to said second shutter plate and configured to move the second shutter plate with respect to the second distribution manifold to control the flow of sublimated second source material therethrough.

A method for depositing stacked thin films on a substrate, the method comprising:

• heating a first source material in a first receptacle positioned within a first chamber of a deposition head to form first source vapors;
• directing the first source vapors through a moveable first shutter plate;
• heating a second source material in a second receptacle positioned within a second chamber of the deposition head to form second source vapors, wherein the first chamber is positioned adjacent to the second chamber;
• directing the second source vapors through a moveable second shutter plate;
• independently moving the first shutter plate and the second shutter plate to independently control flow rates of the first source vapors and the second source vapors through the first shutter plate and the second shutter plate, respectively;
• and,
• transporting a substrate past the first chamber and past the second chamber distribution plate such that a first majority of the first source vapors deposit on a deposition surface of the substrate prior to a second majority of the second source vapors.