Substrate support ring for more uniform layer thickness
AssigneeApplied Materials, Inc.
InventorsHeng Pan, Lara Hawrylchak, Christopher S. Olsen
Life of this patent
Estimating the term…
Abstract
Embodiments of substrate support rings providing more uniform thickness of layers deposited or grown on a substrate are provided herein. In some embodiments, a substrate support ring includes: an inner ring with a centrally located support surface to support a substrate; and an outer ring extending radially outward from the support surface, wherein the outer ring comprises a reaction surface area disposed above and generally parallel to a support plane of the support surface, and wherein the reaction surface extends beyond the support surface by about 24 mm to about 45 mm.
Claims20
A substrate support apparatus, comprising:
- an inner ring comprising a centrally located support surface to support a substrate;
- and
- an outer ring extending radially outward from the support surface, wherein the outer ring comprises a reaction surface area disposed above and generally parallel to a support plane of the support surface, and wherein the reaction surface extends beyond the support surface by about 24 mm to about 45 mm.
A substrate support apparatus, comprising:
- an inner ring comprising a centrally located support surface to support a substrate;
- and
- an outer ring extending radially outward from the support surface, wherein the outer ring comprises a reaction surface area above and generally parallel to a support plane of the support surface, wherein the reaction surface extends beyond the support surface by about 24 mm to about 34 mm, and wherein the reaction surface is about 0.86 to about 0.97 mm above the support surface.
A substrate processing apparatus, comprising:
- a chamber body enclosing a processing volume;
- and
- a substrate support apparatus disposed and supported within the processing volume, the substrate processing apparatus comprising:
- an inner ring comprising a centrally located support surface adapted to support a substrate;
- and
- an outer ring extending radially outward from the support surface, wherein the outer ring comprises a reaction surface area disposed above and generally parallel to a support plane of the support surface, and wherein the reaction surface extends beyond the support surface by about 24 mm to about 45 mm.
Dependencies are inferred from the claim text.