Composition for photoresist development and method of developing photoresist using the same
AssigneeSamsung Electro-Mechanics Co., Ltd.
InventorsChang Bo Lee, Chang Sup Ryu, Dae Jo Hong, Hyo Seung Nam
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Abstract
The present invention provides a composition for developing a photoresist containing a carboxyl group (—COOH) and a method of developing a photoresist using the composition. The composition includes: a first solution including a salt containing a monovalent cationic component; and a second solution including a salt containing a bivalent cationic component. The composition for photoresist development is advantageous in that the developing depth of a photoresist can be controlled, and the developed surface of a photoresist is flat, thereby enabling the photoresist to be developed to realize precise three-dimensional packaging.
Claims19
A developer composition, comprising:
- a metal salt solution;
- and
- a dissolution inhibitor.
Dependencies are inferred from the claim text.