Substrate processing device

A substrate processing device, comprising:

• at least one substrate loading and unloading area for loading and unloading the substrate processing device with at least one substrate;
• at least one evacuable process chamber;
• at least one carrier transport device;
• at least one carrier transport area;
• at least one carrier device, with which the at least one substrate is transported by said at least one carrier transport device in said at least one carrier transport area to said at least one evacuable process chamber;
• gas-tight closing devices including at least one first gas-tight closing device disposed between said at least one evacuable process chamber and said carrier transport area and at least one second gas-tight closing device disposed between said substrate loading and unloading area and said carrier transport area;
• at least one substrate cassette containing substrates and disposed in said substrate loading and unloading area;
• at least one substrate transfer device;
• and
• a substrate transfer area, said substrate loading and unloading area being coupled with said carrier transport area by said substrate transfer area with said at least one substrate transfer device transferring the at least one substrate from said at least one substrate cassette, in which the substrates in different horizontal cassette levels of said substrate cassette are disposed, onto said at least one carrier device, with which the at least one substrate being held in a horizontal carrier level, wherein said substrate transfer area is closeable gas-tight against said substrate loading and unloading area.