Method for the temperature measurement of substrates in a vacuum chamber
AssigneeOerlikon Trading AG, Trubbach
InventorsSiegfried Krassnitzer, Markus Esselbach
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AssigneeOerlikon Trading AG, Trubbach
InventorsSiegfried Krassnitzer, Markus Esselbach
Estimating the term…
The present invention relates to a temperature-measuring system, comprising a temperature sensor and a reference body, wherein means for determining temperature changes of the reference body and/or for control of the temperature of the reference body are provided. When the temperature measuring-system is used in a vacuum, the reference body forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor.
Temperature-measuring system, comprising a temperature sensor and a reference body, characterized in that means for determining temperature changes of the reference body and/or for controlling the temperature of the reference body are provided, wherein the reference body, when the temperature-measuring system is used in a vacuum, forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor.
Method for measuring the temperature of substrates in a vacuum treatment chamber, comprising the following steps:
Dependencies are inferred from the claim text.