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US 2014/0368799 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHelmar Van Santen, Aleksey Kolesnychenko
Life of this patent
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Abstract
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
Claims19
A lithographic apparatus comprising:
- an illumination system configured to provide a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide a liquid to a space between the substrate and the projection system, the liquid supply system comprising a barrier member extending along at least a part of the boundary of the space and being in a position relative to an object on the substrate table so that any capillary pressure generated by the liquid between the barrier member and the object is not large enough to constrain the liquid in the space,
- wherein no seal is provided between the barrier member and the object.
4 more elements
-20. (canceled)
A lithographic apparatus comprising:
- an illumination system configured to provide a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide a liquid to a space between the substrate and the projection system, the liquid supply system comprising a liquid inlet port provided on a boundary of the space,
- wherein the liquid is not substantially confined in the space so that liquid can flow out of the space.
4 more elements
A lithographic apparatus comprising:
- an illumination system configured to provide a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide a liquid to a space between the substrate and the projection system, the liquid supply system comprising a liquid inlet port,
- wherein a liquid outlet port is provided only on the substrate table, or suspended above the substrate table, or both.
4 more elements
Dependencies are inferred from the claim text.