Method and apparatus for model based flexible mrc
AssigneeASML Netherlands B.V.
InventorsTaihui LIU, Been-Der CHEN, Yen-Wen LU
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Abstract
Described herein is a method of processing a pattern layout for a lithographic process, the method comprising: identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement; and reconfiguring the feature, wherein the reconfigured feature still violates the pattern layout requirement, the reconfiguring including evaluating a cost function that measures a lithographic metric affected by a change to the feature and a parameter characteristic of relaxation of the pattern layout requirement.
Claims20
A method of processing an exposure pattern layout for a lithographic process, the method being implemented by a computer and comprising:
- identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement;
- and
- by the computer, keeping or reconfiguring the identified feature, and reconfiguring another feature from the plurality of features wherein the kept or reconfigured identified feature still violates the pattern layout requirement.
A computer program product comprising a non-transitory computer readable medium having instructions stored thereon, which when executed by a computer perform a method of processing an exposure pattern layout for a lithographic process, the method comprising:
- identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement;
- and
- keeping or reconfiguring the identified feature, and reconfiguring another feature from the plurality of features wherein the kept or reconfigured identified feature still violates the pattern layout requirement.
Dependencies are inferred from the claim text.