Back to results
US 2014/0349425 A1Published application
Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same
AssigneeSamsung Display Co., Ltd.
InventorsKi-Beom LEE, Dae-Hwan JANG, Atsushi TAKAKUWA
Life of this patent
Estimating the term…
Abstract
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
Claims14
A method of forming a polarizer, the method comprising:
- providing a reflective layer on a base substrate;
- coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising:
- about 65 percent by weight to about 80 percent by weight of a mono-functional monomer,
- about 5 percent by weight to about 20 percent by weight of a di-functional monomer,
- about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups,
- about 1 percent by weight to about 5 percent by weight of a photoinitiator, and
- less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition;
- contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;
- curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;
- removing the stamp from the photoresist pattern having the wire grid shape;
- and
- etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern to form the polarizer.
9 more elements
A method of manufacturing a display substrate, the method comprising:
- providing a reflective layer on a base substrate;
- coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising
- about 65 percent by weight to about 80 percent by weight of a mono-functional monomer,
- about 5 percent by weight to about 20 percent by weight of a di-functional monomer,
- about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups,
- about 1 percent by weight to about 5 percent by weight of a photoinitiator, and
- less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition;
- contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;
- curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;
- removing the stamp from the photoresist pattern having the wire grid shape;
- etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern;
- providing a planarizing protecting film on the wire grid pattern;
- and
- providing a switching element array on the planarizing protecting film to manufacture the display substrate.
11 more elements
A method of manufacturing a display substrate, the method comprising:
- providing a reflective layer on a first surface of a base substrate;
- coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising
- about 65 percent by weight to about 80 percent by weight of a mono-functional monomer;
- about 5 percent by weight to about 20 percent by weight of a di-functional monomer;
- about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups;
- about 1 percent by weight to about 5 percent by weight of a photoinitiator;
- and
- less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition;
- contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;
- curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;
- removing the stamp from the photoresist pattern having the wire grid shape;
- etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern;
- providing a planarizing protecting film on the wire grid pattern;
- and
- providing a switching element array on a second surface opposite to the first surface of the base substrate to manufacture the display substrate.
12 more elements
Dependencies are inferred from the claim text.