Stage apparatus, lithography apparatus, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMasanori YAMADA
Life of this patent
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Abstract
A stage apparatus includes: a coarse moving stage; a fine moving stage located at an interval from the coarse moving stage in a first direction; an electromagnetic actuator including a first core located on one of the coarse moving stage and the fine moving stage and a second core located on the other of the coarse moving stage and the fine moving stage and configured to accelerate or decelerate the fine moving stage in a second direction perpendicular to the first direction; and a controller configured to correct a command value of a thrust of the electromagnetic actuator in the second direction in accordance with a relative position of the fine moving stage with respect to the coarse moving stage in the first direction.
Claims8
A stage apparatus comprising:
- a coarse moving stage;
- a fine moving stage located at an interval from said coarse moving stage in a first direction;
- an electromagnetic actuator including a first core located on one of said coarse moving stage and said fine moving stage and a second core located on the other of said coarse moving stage and said fine moving stage and configured to accelerate or decelerate said fine moving stage in a second direction perpendicular to the first direction;
- and
- a controller configured to correct a command value of a thrust of said electromagnetic actuator in the second direction in accordance with a relative position of said fine moving stage with respect to said coarse moving stage in the first direction.
A lithography apparatus for forming a pattern of an original on a substrate, the apparatus comprising:
- a stage apparatus configured to hold at least one of the original and the substrate,
- said stage apparatus including:
- a coarse moving stage;
- a fine moving stage located at an interval from said coarse moving stage in a first direction;
- an electromagnetic actuator including a first core located on one of said coarse moving stage and said fine moving stage and a second core located on the other of said coarse stage and said fine moving stage and configured to accelerate or decelerate said fine moving stage in a second direction perpendicular to the first direction;
- and
- a controller configured to correct a command value of a thrust of said electromagnetic actuator in the second direction in accordance with a relative position of said fine moving stage with respect to said coarse moving stage in the first direction.
A method of manufacturing a device, the method comprising:
- forming a pattern of an original on a substrate using a lithography apparatus;
- developing the substrate on which the pattern is formed;
- and
- processing the developed substrate to manufacture the device,
- the lithography apparatus comprising
- a stage apparatus configured to hold at least one of the original and the substrate,
- the stage apparatus including:
- a coarse moving stage;
- a fine moving stage located at an interval from the coarse moving stage in a first direction;
- an electromagnetic actuator including a first core located on one of the coarse moving stage and the fine moving stage and a second core located on the other of the coarse moving stage and the fine moving stage and configured to accelerate or decelerate the fine moving stage in a second direction perpendicular to the first direction;
- and
- a controller configured to correct a command value of a thrust of the electromagnetic actuator in the second direction in accordance with a relative position of the fine moving stage with respect to the coarse moving stage in the first direction.
Dependencies are inferred from the claim text.