Film-Growth Model Using Level Sets
AssigneeDino Technology Acquisition LLC
InventorsDaniel Ping Peng, Masaki Satake, Changqing Hu
Life of this patent
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AssigneeDino Technology Acquisition LLC
InventorsDaniel Ping Peng, Masaki Satake, Changqing Hu
Estimating the term…
A technique for determining a set of surface profiles in a multilayer stack during a fabrication process may be determined using a model of this fabrication process, a geometry of the multilayer stack (such as a pre-defined geometry of the multilayer stack) and a surface profile in the multilayer stack (such as a measured surface profile of the top surface or a bottom surface of the multilayer stack). For example, the model of the fabrication process may be based on a generalized Eikonal equation. In conjunction with deposition rates and/or physical properties of the layers in the multilayer stack, deposition or growth of the multilayer stack may be simulated. Based on the determined set of surface profiles, an acceptance condition of the multilayer stack (such as a multilayer stack in a photo-mask for use in extreme ultra-violet photolithography) may be determined and/or a remedial action may be recommended.
A computer-implemented method for determining a set of surface profiles, comprising:
The method of claim 7, wherein the optical characteristic includes information corresponding to a complex index of refraction of the multilayer stack at one wavelength.
A non-transitory computer-program product for use in conjunction with a computer system, the computer-program product comprising a computer-readable storage medium and a computer-program mechanism embedded therein to determine a set of surface profiles, the computer-program mechanism including:
A computer system, comprising:
Dependencies are inferred from the claim text.