Monitoring pattern for devices
AssigneeGLOBALFOUNDRIES Singapore Ptd. Ltd.
InventorsGuoxiang NING, Paul ACKMANN, Byoung IL CHOI
Life of this patent
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Abstract
Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern. The first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell. A wafer with a resist layer is exposed with a lithographic system using the reticle. The resist is developed to form a patterned resist layer on the wafer and the wafer is processed using the patterned resist layer.
Claims20
A method of forming a device comprising:
- providing a reticle with a device pattern and a first monitoring pattern, wherein the first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern, wherein the first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell;
- exposing a wafer with a resist layer with a lithographic system using the reticle;
- developing the resist to form a patterned resist layer on the wafer;
- and
- processing the wafer using the patterned resist layer.
A method of forming a reticle comprising:
- providing a reticle blank having a frame region, a prime region and an external region;
- providing a pellicle which surrounds and protects the reticle blank, wherein a portion of the external region outside of the pellicle comprises a reticle monitoring pattern, wherein the reticle monitoring pattern includes a plurality of reticle test cells having a reticle test cell area and a reticle test pattern, wherein the reticle test cells have different reticle pitch ratios to an anchor pitch and the reticle test pattern fills the reticle test cell area of a reticle test cell;
- patterning the reticle using electron-beam;
- and
- monitoring the reticle monitoring pattern for PEC of the electron beam.
A reticle comprising:
- a prime region, wherein the prime region comprises a pattern of a device layer;
- a frame region surrounding the prime region;
- and
- a wafer monitoring pattern disposed in the prime region, wherein the wafer monitoring pattern comprises a plurality of wafer test cells having a wafer test cell area and a wafer test pattern, wherein the wafer test cells have different wafer pitch ratios to an anchor pitch and the wafer test pattern fills the wafer test cell area of a wafer test cell.
Dependencies are inferred from the claim text.