Photosensitive sacrificial polymer with low residue
AssigneeGeorgia Tech Research Corporation
InventorsPAUL KOHL, YU-CHUN CHEN
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Abstract
Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to the present invention also relate to a method of using such bilayers and unilayers to form microelectronic structures having a three-dimensional space, and methods of decomposition of the sacrificial polymer within the aforementioned layers.
Claims20
A bilayer structure for use in an electronic device comprising:
- a first polymer layer formed overlying a substrate, said layer consisting of at least a sacrificial polymer;
- a second polymer layer formed overlying said first polymer layer, said second layer consisting of at least said sacrificial polymer and a photoacid generator;
- said bilayer structure used to form an air gap structure for use in the electronic device.
The bilayer structure of claim 6 where the concentration of the photoacid generator is from 2 weight percent of the polymer to 10 weight percent of the polymer.
Dependencies are inferred from the claim text.