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AssigneeApplied Materials, Inc.
InventorsAndrew NGUYEN, Bradley HOWARD, Shahid RAUF, Ajit BALAKRISHNA, Tom K. CHO, Kenneth S. COLLINS, Anand KUMAR, Michael D. WILLWERTH, Yogananda S. VISHWANATH
Estimating the term…
Embodiments of the present disclosure generally provide various apparatus and methods for reducing particles in a semiconductor processing chamber. One embodiment of present disclosure provides a vacuum screen assembly disposed over a vacuum port to prevent particles generated by the vacuum pump from entering substrate processing regions. Another embodiment of the present disclosure provides a perforated chamber liner around a processing region of the substrate. Another embodiment of the present disclosure provides a gas distributing chamber liner for distributing a cleaning gas around the substrate support under the substrate supporting surface.
A vacuum screen assembly configured to dispose between a processing chamber and a vacuum pump connected to the processing chamber, comprising:
A chamber liner comprising:
A gas distributing chamber liner, comprising:
Dependencies are inferred from the claim text.