Deposition injection masking
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Chiang Chang, Yi-Nien Su, Su-Jen Sung, Chao-Chun Wang, Hsiang-Wei Lin
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Chiang Chang, Yi-Nien Su, Su-Jen Sung, Chao-Chun Wang, Hsiang-Wei Lin
Estimating the term…
In deposition devices, a precursor is directed at a substrate within a deposition chamber, and a block plate comprising a set of block plate apertures adjusts the direction and volume of the outflowing precursor. However, arrangements of block plate apertures that are suitable for some deposition scenarios (such as one type of precursor) are unsuitable for other deposition scenarios, resulting in precursor deposition that is undesirably thick, thin, or inconsistent. A set of block plate masks positioned over respective zones of the block plate are adjustable to align a set of masking apertures with respect to the block plate apertures, such as by operating a block plate motor to rotate a ring-shaped block plate mask over a cylindrical zone of the block plate. This configuration enables adjustable exposure of the block plate apertures to control the adjusted outflow of precursor through the block plate.
A deposition device, comprising:
A block mask set usable with a deposition device, the deposition device comprising:
A method of exposing a substrate to a precursor in a deposition device comprising:
Dependencies are inferred from the claim text.