US 2014/0232032 A1 · LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING METHOD, AND PATTERN DATA CREATING METHOD

Abstract

In one embodiment, a lithography original checking method includes applying resin onto a first lithography original having a first concavo-convex pattern, hardening the resin, releasing the hardened resin from the first lithography original and producing a second lithography original having a second concavo-convex pattern corresponding to the first concavo-convex pattern, enlarging the second lithography original, detecting a defect on the enlarged second lithography original, and calculating a position of a defect on the first lithography original based on the position of the detected defect.

Claims14

Dependent claims

A lithography original checking method comprising:

applying resin onto a first lithography original having a first concavo-convex pattern;
hardening the resin;
releasing the hardened resin from the first lithography original and producing a second lithography original having a second concavo-convex pattern corresponding to the first concavo-convex pattern;
enlarging the second lithography original;
detecting a defect on the enlarged second lithography original;
and
calculating a position of a defect on the first lithography original based on the position of the detected defect.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

14/018,013Filed 4 Sep 2013

Priority

JP 2013-03230421 Feb 2013

Published

21 Aug 2014

Term ends

Not estimatedThe source records don’t support an estimate.

Classification4 codes

G01N 1/2806
Preparing specimens for investigation including physical details of chemical methods covered elsewhere, e.g. G01N33/50, C12Q: means for preparing…
G03F 7/0002
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
G01N
Investigating or analysing materials by determining their chemical or physical properties
G03F
Photomechanical production of textured or patterned surfaces

Lithography original checking device, lithography original checking method, and pattern data creating method

Life of this patent

Lithography original checking device, lithography original checking method, and pattern data creating method

Life of this patent

Abstract

Claims14