Thin film transistor array panel and method of manufacturing the same

A method of manufacturing a thin film transistor array panel, the method comprising:

• forming a gate line and a data line on an insulation substrate;
• forming a first passivation layer on the gate line and the data line;
• depositing a transparent conductor on the first passivation layer;
• forming a transparent photosensitive organic layer on the transparent conductor;
• etching the transparent conductor using the transparent photosensitive organic layer as an etching mask to form a first field generating electrode;
• hard-baking the transparent photosensitive organic layer to form a second passivation layer covering an upper surface of the first field generating electrode and a side surface of an edge of the first field generating electrode;
• and
• forming a second field generating electrode on the second passivation layer.

A method of manufacturing a transistor array panel, the method comprising:

• forming a signal line on a substrate;
• forming a first passivation layer on the signal line;
• forming a transparent conducting layer on the first passivation layer;
• forming a transparent photosensitive layer on the transparent conducting layer;
• and
• etching the transparent conducting layer using the transparent photosensitive layer as an etching mask to form a field generating electrode.