US 2014/0231308 A1 · MIXING DEVICE WITH TANGENTIAL INLETS FOR TWO-PHASE CONCURRENT VESSELS

Abstract

A mixing device for mixing concurrently-flowing streams of vapor and liquid in a vessel contains flow baffles forming a tangential inlet orifice through which the liquid and vapor streams flow at high flow velocity and in a tangential direction into a swirl box. The high momentum of the streams in the inlet orifice, the tangential direction of the streams, and the large distance between the inlet orifice and the vessel centerline, result in a violent swirling flow and a large number of fluid rotations in the swirl box, thereby thoroughly mixing the streams entering through the inlet orifice. A mixed stream of vapor and liquid exits the mixing device through an outlet opening in the bottom of the mixing device. An impingement plate located below the outlet opening spreads the liquid and decreases the velocity of the mixed stream. The temperature and chemical composition of the mixed stream are equilibrated.

Claims25

Dependent claims

A method for admixing vapor and liquid flowing concurrently in a catalytic reactor between an upper catalyst bed and a lower catalyst bed thereof, the method comprising the steps of:

providing a swirl box comprising a top wall, a side wall and a bottom wall;
an outlet opening in the bottom wall;
and at least one tangential inlet orifice configured for entry of said vapor and liquid into said swirl box;
passing said vapor and liquid from a space above said swirl box through said at least one tangential inlet orifice and into said swirl box at a location near said side wall and in a direction close to a flow direction of the swirling vapor and liquid inside the swirl box adjacent the at least one tangential inlet orifice;
rotating said vapor and liquid around said outlet opening during a residence time inside said swirl box to provide mixing of said vapor and liquid;
and
passing said vapor and liquid from said swirl box through said outlet opening to a space below said swirl box.

4 more elements

A mixing device for use in a catalytic reactor and arranged between an upper catalyst bed and a lower catalyst bed thereof for admixing vapor and liquid flowing concurrently inside said reactor through said upper and lower catalyst beds, said mixing device comprising:

a swirl box comprising a top wall, a side wall and a bottom wall;
at least one passageway configured for conducting a concurrent flow of said vapor and liquid in said reactor from a space above said swirl box into said swirl box;
at least one tangential inlet orifice located in said at least one passageway and configured for high velocity injection of said vapor and liquid into said swirl box, said at least one tangential inlet orifice having a flow-through area relative to the flow rate of said vapor such that a superficial vapor flow velocity in said at least one tangential inlet orifice exceeds VvDispersed as defined in equation (a)
V
v
Dispersed
=
1.08

m
s
×
ρ
L
ρ
v
(
a
)
during at least one operational phase of said reactor, for dispersion of the liquid into the vapor and/or the vapor into the liquid, and for introducing a swirling flow inside said swirl box, said at least one tangential inlet orifice having an orientation resulting in a flow velocity vector of said injected vapor and liquid that is substantially parallel to a flow direction of the vapor and liquid inside the swirl box at the point of injection of said vapor and liquid;
and
an outlet opening in said bottom wall configured for conducting a concurrent flow of said vapor and liquid from said swirl box to a space below said swirl box.

19 more elements

Dependencies are inferred from the claim text.

Mixing device with tangential inlets for two-phase concurrent vessels

Life of this patent

Mixing device with tangential inlets for two-phase concurrent vessels

Life of this patent

Abstract

Claims25