Optical proximity correction for topographically non-uniform substrates

A method, comprising:

• with a computer,
• receiving information of a layout design, the layout design corresponding to at least a portion of an integrated circuit;
• constructing models for one or more categories of light signals based on the information of the layout design, the one or more categories of light signals comprising trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals;
• performing simulation on the layout design to generate an aerial image based on optical models for a plurality of substrate types, one or more optical models for transition regions and the models for the one or more categories of light signals;
• and
• storing information of the aerial image.

A system comprising:

• one or more processors, the one or more processors programmed to perform a method, the method comprising:
• receiving information of a layout design, the layout design corresponding to at least a portion of an integrated circuit;
• constructing models for one or more categories of light signals based on the information of the layout design, the one or more categories of light signals comprising trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals;
• performing simulation on the layout design to generate an aerial image based on optical models for a plurality of substrate types, one or more optical models for transition regions and the models for the one or more categories of light signals;
• and
• storing information of the aerial image.