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US 2014/0227635 A1Published application
Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same
AssigneeSK hynix Inc.
InventorsYong Dae KIM, Byung Ho NAM
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Abstract
Reflection type blank masks are provided. The blank mask includes a substrate having a recessed pattern with a pretermined depth, a reflection layer substantially on the substrate, an absorption layer substantially on the reflection layer, and a resist layer substantially on the absorption layer, wherein the resist layer has a recessed part that is formed by transference of the profile from the recessed pattern.
Claims8
A reflection type blank mask, the blank mask comprising:
- a substrate having a recessed pattern with a pretermined depth;
- a reflection layer substantially on the substrate;
- an absorption layer substantially on the reflection layer;
- and
- a resist layer substantially on the absorption layer, wherein the resist layer has a recessed part that is formed by transference of the profile from the recessed pattern.
2 more elements
A reflection type blank mask, the blank mask comprising:
- a substrate having a protruded pattern with a pretermined height;
- a reflection layer substantially on the substrate;
- an absorption layer substantially on the reflection layer;
- and
- a resist layer substantially on the absorption layer, wherein the resist layer has a protruded part that is formed by transference of the profile from the protruded pattern.
2 more elements
Dependencies are inferred from the claim text.