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AssigneeHoneywell International Inc.
InventorsTeresa Baldwin, Joseph Kennedy, Nancy Iwamoto, Tadashi Nakano, William Bedwell, Jason Stuck, Arlene Suedmeyer, Mello Hebert
Estimating the term…
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds
An absorbing composition formed from the constituents consisting of:
(canceled)
The composition of claim 104, wherein the incorporatable absorbing compound is an organic-based compound.
The composition of claim 104, wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 0.5 nm wide wavelength range at wavelengths less than 375 nm.
The composition of claim 104, wherein the incorporatable absorbing compound strongly absorbs light over at least an approximately 10 nm wide wavelength range at wavelengths less than 375 nm.
7-8. (canceled)
The composition of claim 104, wherein the incorporatable absorbing compound comprises anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy)-diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-alkyl triethoxysilane, phenyltriethoxysilane, 10-phenanthrene carboxy-methyl triethoxysilane, 4-phenylazophenol, 4-ethoxyphenylazobenzene-4-carboxy-methyl triethoxysilane, 4-methoxyphenylazobenzene-4-carboxy-methyl triethoxysilane or mixtures thereof.
11-12. (canceled)
The composition of claim 104, wherein the at least one silicon-based compound comprises at least one organosiloxane compound.
The composition of claim 104, wherein the at least one silicon-based compound comprises hydrogensiloxane, hydrogensilsesquioxane, organohydridosiloxane, silsesquioxane-based compounds, derivatives of silicic acid and organhydridosilsesquioxane polymers;
The composition of claim 104, wherein the polymer is of a general formula comprising (H0-1.0SiO1.5-2.0)x, where x is greater than about 4, or (H0-1.0SiO1.5-2.0)n(R0-1.0SiO1.5-2.0)m, where m is greater than 0, the sum of n and m is from about 4 to about 5000 and R is a C1-C20 alkyl group or a C6-C12 aryl group.
16-35. (canceled)
A coating solution comprising the composition of claim 104 and an additional solvent or a solvent mixture.
38-101. (canceled)
(canceled)
An absorbing composition formed from the constituents consisting of:
Dependencies are inferred from the claim text.