Film deposition apparatus and film deposition method

A film deposition apparatus for depositing a film on a substrate by performing plural cycles of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to produce a layer of a reaction product in a chamber, the film deposition apparatus comprising:

• a turntable that is rotatably provided in a chamber and includes a substrate receiving area in which a substrate is placed, wherein said turntable has an upper surface, a lower surface, and a side surface that is positioned between the upper surface of the turntable and the lower surface of the turntable, and wherein said chamber has an upper surface, a lower surface, and a side surface that is positioned between the upper surface of the chamber and the lower surface of the chamber;
• a separation member that extends to cover a rotation center of the turntable and two different points on a circumference of the turntable above the turntable, thereby separating the inside of the chamber into a first area and a second area, wherein a pressure in a space between the turntable and the separation member may be maintained higher than pressures of the first area and the second area by use of a first separation gas supplied to the space, said separation member having a bent portion that substantially fills in a gap between the side surface of the turntable and the side surface of the chamber;
• a pressure control portion that maintains along with the separation member the pressure in the space between the turntable and the separation member higher than the pressures in the first area and the second area;
• a first reaction gas supplying portion that is provided in the first area and supplies a first reaction gas toward the turntable;
• a second reaction gas supplying portion that is provided in the second area and supplies a second reaction gas toward the turntable;
• a first evacuation port that evacuates therefrom the first reaction gas supplied in the first area and the first separation gas supplied to the space between the separation member and the turntable by way of the first area, after the first reaction gas and the first separation gas converge with each other in the first area;
• and
• a second evacuation port that evacuates therefrom the second reaction gas supplied in the second area and the first separation gas supplied to the space between the separation member and the turntable by way of the second area, after the second reaction gas and the first separation gas converge with each other in the second area.