Method for manufacturing imprint mold and resist developing device

A resist developing device for applying development processing to a substrate to be processed by supplying a developing solution to the substrate to be processed, the device comprising:

• a storage part configured to store the developing solution, with a temperature controlled to a constant temperature;
• a holding part configured to hold the substrate to be processed;
• a supply pipe configured to form a flow passage for flowing the developing solution stored in the storage part, and having a discharging part for discharging the developing solution flowed through the flow passage, and configured to supply the developing solution to the substrate to be processed by discharging the developing solution from the discharging part toward the substrate to be processed which is held by the holding part;
• and
• a position-change part configured to perform the first position-change operation for varying a discharging direction of the discharging part in a non-reaching direction for not allowing the developing solution discharged from the discharging part of the supply pipe to reach the substrate to be processed, and a second position-change operation for varying the discharging direction of the discharging part in a reaching direction for allowing the developing solution discharged from the discharging part of the supply pipe to reach the substrate to be processed.