Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method

A lithography apparatus, comprising:

• a programmable patterning device configured to provide a plurality of individually controllable radiation beams, the programmable patterning device comprising a radiation modulator, the radiation modulator comprising a plurality of waveguides and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide the plurality of individually controllable radiation beams;
• and
• a projection system configured to project each of the radiation beams onto a respective location on a target.

A method of modulating radiation for use in lithography, the method comprising:

• providing a plurality of waveguides for supporting propagation therethrough of radiation having a wavelength less than 450 nm;
• and
• individually modulating radiation in each of the waveguides in order to provide a modulated plurality of output beams.