Template, manufacturing method of the template, and strain measuring method in the template
AssigneeKabushiki Kaisha Toshiba
InventorsHidenori SATO, Yuji KOBAYASHI
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Abstract
According to one embodiment, provided is a template including a first pattern that is to be transferred to a processing target and is arranged on a transfer region defined on a first principal surface of a template substrate. The template includes a second pattern that is used to measure a position and arranged on a second principal surface of the template substrate opposite to the first principal surface.
Claims20
A template, comprising:
- a first pattern that is to be transferred to a processing target and is arranged on a transfer region defined on a first principal surface of a template substrate;
- and
- a second pattern that is used to measure a position and arranged on a second principal surface of the template substrate opposite to the first principal surface.
A manufacturing method of a template, comprising:
- forming a first pattern used to measure a position on a first principal surface of a template substrate;
- and
- forming a second pattern to be transferred to a processing target on a second principal surface opposite to the first principal surface of the template substrate.
A strain measuring method in a template, the template including a transfer region in which a first pattern to be transferred to a processing target is arranged on a first principal surface and a second pattern that is used to measure a position and is arranged on a second principal surface opposite to the first principal surface, the method comprising:
- measuring a first position of the second pattern within the second principal surface;
- coating the processing target with an imprint material;
- arranging the processing target coated with the imprint material and the first principal surface of the template to face each other;
- pressing while causing the processing target to come into contact with the template, solidifying the imprint material, and transferring the first pattern to the processing target;
- measuring a second position of the second pattern within the second principal surface after the transferring;
- and
- measuring positional deviation of each second pattern based on the second position and the first position.
Dependencies are inferred from the claim text.