Mounting table and plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber that partitions a processing space where plasma is generated;
• a gas supply unit configured to supply a processing gas into the processing space;
• a first electrode provided in the processing space;
• and
• a mounting table accommodated in the processing space and configured to mount thereon a target object,
• wherein the mounting table comprises:
• a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, the rear surface being connected to a power supply member configured to apply a voltage, a groove portion having a bottom surface within the base member being annularly formed on the front surface when viewed from a direction perpendicular to the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion;
• a mounting member that is supported by the inner base member portion and has a mounting surface on which the target object is mounted;
• an annular focus ring that is supported by the outer base member portion and arranged to surround the mounting surface when viewed from a direction perpendicular to the mounting surface, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion when viewed from the direction perpendicular to the mounting surface;
• a first heat transfer member provided between the mounting surface and the coolant path;
• and
• a second heat transfer member provided between the focus ring and the coolant path.